This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP) for integrated circuits using ruthenium (Ru) as a novel barrier layer material. Pursuing a systematic approach to resolve the remaining critical issues in the CMP, it first investigates the tribocorrosion properties and the material removal mechanisms of copper (Cu) and Ru in KIO4-based slurry. The thesis subsequently studies Cu/Ru galvanic corrosion from a new micro and in-situ perspective, and on this basis, seeks ways to mitigate corrosion using different slurry additives. The findings presented here constitute a significant advance in fundamental and technical investigations into the CMP, while also laying the groundwork for future research.
| Autorius: | Jie Cheng |
| Serija: | Springer Theses |
| Leidėjas: | Springer Nature Singapore |
| Išleidimo metai: | 2017 |
| Knygos puslapių skaičius: | 156 |
| ISBN-10: | 9811061645 |
| ISBN-13: | 9789811061646 |
| Formatas: | Knyga kietu viršeliu |
| Kalba: | Anglų |
| Žanras: | Tribology (friction and lubrication) |
Parašykite atsiliepimą apie „Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect“
